News

2025-10-15
A joint research team, affiliated with UNIST and Yonsei University introduced a novel technique that aims to prevent material damage and reduce toxicity in semiconductor manufacturing.
2025-04-30
Their findings were published on March 24 in JACS Au, a prestigious journal of the American Chemical Society (ACS). The study highlights the first-ever synthesis of algorithm-selected ZIFs, showcasing the synergy of computational screening and experimental validation in advanced materials discovery.